A Full-dry Processing Technique from Sacrificial Layer Etching to Water-repellent Coating
نویسندگان
چکیده
منابع مشابه
Silicon Sacrificial Layer Dry Etching (SSLDE) for free-standing
A novel Silicon Sacrificial Layer Dry Etching (SSLDE) technique using sputtered amorphous or LPCVD polycrystalline silicon as sacrificial layers and a dry fluorine-based (SF6) plasma chemistry as releasing process is reported with a detailed experimental study of the release etching step. The process is capable of various applications in surface micromachining process, and can be applied in fab...
متن کاملThree-Dimensional Sacrificial Etching
In MEMS fabrication micro-mechanical components have to be partially released from a substrate. Selectively etching away sacrificial layers, such that a free standing structure remains, is a widely used technique for this purpose. Free standing structures allow MEMS devices to induce or to sense mechanical movements or vibrations. During sacrificial etching lower etch rates than the blanket one...
متن کاملPTEE Based Water Repellent Coating for Telecommunication Antennas
Since thick snow or ice adhering to the surface of an antenna used for radio communication can impede telecommunication [1], methods to reduce the buildup of snow and ice are needed. Various methods have been investigated. For example, the adhesion of ice to common rubber has been measured [2], and recently, a method that takes advantage of the physicochemical properties of material surfaces ha...
متن کاملRapid Sacrificial Germanium Etching Using Xenon Difluoride
We present a novel micromachining procedure employing the noble gas halide, xenon difluoride (XeF2), to rapidly undercut a sacrificial layer comprised of low-temperature deposited amorphous germanium (α-Ge). As a proof of concept, this process is utilized to fabricate electrostatically-actuated suspended Bragg mirrors applicable to wavelength-tunable surface-normal photonic devices. Exploiting ...
متن کاملThree-dimensional simulation of sacrificial etching
Sacrificial etching is one of the most important process steps in micro-electro-mechanical systems technology, since it enables the generation of free-standing structures. These structures are often the main part of micro-mechanical devices, intended to sense or induce a mechanical movement. The etching process transforms an initial multi-segmented geometry and depends on material properties an...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: IEEJ Transactions on Sensors and Micromachines
سال: 2003
ISSN: 1341-8939,1347-5525
DOI: 10.1541/ieejsmas.123.190